Advances in Multilayer Optics for Femtosecond Sources
by
Andrew Aquila, Deutsches Elektonen-Synchrotron DESY, FS-CFEL-1,
→
Europe/Berlin
Building 49, Seminar-Room 108
Building 49, Seminar-Room 108
Description
The development of multilayer optics for extreme ultraviolet (EUV)
radiation has led to advancements in many areas of science and
technology, including materials studies, EUV lithography, water window
microscopy, plasma imaging, and orbiting solar physics imaging. Recent
developments in generation combined with the elemental and chemical
specificity, provided by EUV radiation, are opening new opportunities to
study fundamental dynamic processes in materials. Critical to these
efforts is the design and fabrication of multilayer optics to transport,
focus, shape and image these ultra-fast pulses.
This talk describes the design, characterization, and application of
multilayer optics for EUV femtosecond and attosecond scientific studies.
Multilayer mirrors for bandwidth control, pulse shaping and
compression, improvements using tri-material multilayers, and
multilayers for polarization control are described. An application of
multilayer mirrors for polarization control to study femtosecond spin
dynamics, in collaboration with T-Rex group at Elettra, is also discussed.
