Speaker
Description
Multilayer Laue lenses (MLLs) is an extension of Fresnel zone plates in the form of a volume diffracting element, which is a promising optical element in synchrotron radiation facility. By the means of dynamical diffraction theory, DC magnetron sputtering, laser etching and focused ion beam lithography, two-dimensional MLLs with 63×43 μm2 aperture and focal spot of 8×8 nm2 @ 10keV are designed and fabricated in High Energy Photon Source (HEPS). Beside the conventional MLL, Single-order focus multilayer Laue lens [1], novel figuring method for multilayer Laue lens [2] and a linear gradient multilayer Laue lens [3] were proposed by the hard X-ray nano-probe beamline of HEPS. The Single-order focusing MLL could suppresses higher-order diffractions effectively, which will substantially increase the working distance for the MLL systems. This figuring method will reduce the requirements for MLLs: the total thickness and layer placement accuracy of the multilayer structure, which are the main constraints on the development of the large aperture MLLs, thus making the fabrication of larger NA MLL with a longer working distance possible. The linear gradient MLL could achieve considerable efficiency as a wedge MLL but with simpler fabrication method. These new designs for MLL can reduce the difficulty of preparing MLL to a certain extent as well as increase the focusing performance and practicality of MLL.
[1] Ji B, Yue S, Zhou L, et al. Single-order focus multilayer Laue lens[J]. Applied Optics, 2022, 61(27): 8028-8033.
[2] Ji B, Yue S, Zhou L, et al. Novel figuring method for a multilayer Laue lens[J]. Optics Express, 2022, 30(26): 46838-46848.
[3] Ji B, Yue S, Hou Q, et al. A linear gradient multilayer Laue lens[J]. Optics Communications, 2024, 552: 130031.
| I plan to submit also conference proceedings | Yes |
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