Structural analysis of diblock copolymer nanotemplates using grazing incidence scattering
by
Denis Korolkov, FZ Jülich
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Europe/Berlin
25b, room 109
25b, room 109
Description
The aim of the present work is twofold.
First, the method for the preparation of lithography nanotemplates using self-organized diblock copolymer thin films, which will be used for fabrication of ordered magnetic nanostructures on a large surface area (more than 1 × 1 cm^2), was probed. The structural analysis of obtained nanotemplates with three different types of structures (lamellar, cylinders, spheres) and different thicknesses of the polymer films was made by atomic force microscope (AFM), grazing incidence small angle (neutron) x-ray scattering (GISA(N)XS) and neutron reflectometry. The comparing of results from these three techniques and analysis of the data are given.
Second aim was to achieve simulations of GISANS patterns taking into account an instrumental resolution effects and scattering cross section of the randomly oriented lateral nanostructures. For simulations two approaches were used. Together with diffraction spots positions given by structure factor of the lattice, formed by microphase separated polymer blocks, the calculated resolution function allowed us to estimate the contribution of instrument geometry into the broadening of diffraction spots on the detector. The second approach is a full calculation of the intensity by distorted wave born approximation and instrumental smearing effects, described by the resolution function. In both models a random orientation of nanostructures was taken into account and Debye-Scherrer rings were simulated.
