In-situ X-ray reflectometry: possibilities and perspectives

by I.V. Kozhevnikov (Shubnikov Institute of Crystallography, Moscow, Russia)

Thursday, November 10, 2011 from to (Europe/Berlin)
at AER19, Room 4.14
The X-ray reflectometry technique considered here consists of measuring and analyzing the reflectance of a layered thin film versus grazing angle and the angular distribution of radiation scattered by roughness. This is a unique method for studying matter both in depth (stratified inhomogeneities) and in the lateral direction (roughness) with sub-nanometer resolution.
Current possibilities and future perspectives of X-ray reflectometry are discussed:
	- Relation between the Distorted Wave Born Approximation method and the perturbation theory on the roughness height, the suitability of these methods for the analysis of roughness.
	- In situ X-ray reflectometry of a growing/eroded film.
	- Inverse problem of X-ray reflectometry.
	- Self-consistent approach to study the 3D morphology of a thin film, i.e. determination of the roughness parameters and reconstruction of the depth-distribution of the dielectric constant at once.