Description
High Power Impulse Magnetron Sputtering (HiPIMS) is an emerging physical vapor deposition technique in industry and research which allows for creating novel polymer-metal composites. One reason is its higher ionized fraction of ions during deposition compared to conventional sputter and evaporation techniques. First results in the literature show a big advantage over conventional sputter or evaporation processes: Metal layer deposited by HiPIMS have shown an increased adhesion compared to the conventional deposition techniques and it does not require any post and pretreatments, which usually are detrimental for the polymer film,e.g. in solar cells. Yet, the microscopic reasons for the increased adhesion remain unknown.
In this project you are going to prepare polymer thin films on silicon with certain thicknesses via spin coating, which will be sputter-coated with coinage metals. Afterwards, you are going to characterize the samples with atomic force microscopy (AFM), electric conductivity, optical microscopy, ellipsometrie, X-ray reflectometry (XRR), grazing incidence small angle x-ray scattering (GISAXS) and grazing incidence wide-angle scattering (GIWAXS).
| Field | A1: Solid-state physics and nanoscience (application oriented) |
|---|---|
| DESY Place | Hamburg |
| DESY Division | FS |
| DESY Group | FS-PETRA-D |
